Searched for: subject:"electron%5C+beam%5C+induced%5C+deposition"
(1 - 9 of 9)
document
Scotuzzi, M. (author), Kamerbeek, M.J. (author), Goodyear, A. (author), Cooke, M. (author), Hagen, C.W. (author)
To demonstrate the possibility of using EBID masks for sub-10 nm pattern transfer into silicon, first experiments were carried out by using 20-40 nm EBID masks, that were etched by different chemistries. It is experimentally verified that recipes based on hydrogen bromide, chlorine and boron trichloride can selectively etch silicon when using 20...
conference paper 2015
document
Scotuzzi, M. (author), Kamerbeek, M.J. (author), Goodyear, A. (author), Cooke, M. (author), Hagen, C.W. (author)
To demonstrate the possibility of using electron beam-induced deposition (EBID) masks for sub-10 nm pattern transfer into silicon, first experiments were carried out by using 20- to 40-nm EBID masks, which were etched by different chemistries. It is experimentally verified that recipes based on hydrogen bromide, chlorine, and boron trichloride...
journal article 2015
document
Hari, S. (author), Hagen, C.W. (author), Verduin, T. (author), Kruit, P. (author)
In a first study to analyze the feasibility of electron beam-induced deposition (EBID) for creating certain patterns in advanced lithography, line patterns were fabricated on silicon wafers using EBID. The growth conditions were such that the growth rate is fully determined by the electron flux (the current limited growth regime). It is...
journal article 2014
document
Wnuk, J.D. (author), Gorham, J.M. (author), Rosenberg, S.G. (author), Madey, T.E. (author), Hagen, C.W. (author), Fairbrother, D.H. (author)
Focused electron beam induced processing (FEBIP) of volatile organometallic precursors has become an effective and versatile method of fabricating metal-containing nanostructures. However, the electron stimulated decomposition process responsible for the growth of these nanostructures traps much of the organic content from the precursor’s ligand...
journal article 2010
document
Botman, A.P.J.M. (author)
Electron beam induced deposition (EBID) is a novel nanofabrication technique allowing the rapid prototyping of three-dimensional nanodevices and the metallic wiring of nanostructures, and is a promising technique for many applications in nanoresearch. EBID is a process wherein a precursor molecule containing the material to be deposited is...
doctoral thesis 2009
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Van Dorp, W.F. (author), Wnuk, J.D. (author), Gorham, J.M. (author), Fairbrother, D.H. (author), Madey, T.E. (author), Hagen, C.W. (author)
The total cross section has been measured for the electron induced dissociation of trimethyl (methylcyclopentadienyl) platinum (IV) [MeCpPt(IV)Me3], a Pt precursor often used in focused electron beam induced processing (FEBIP), for incident electron energies ranging between 3–3 keV. Measurements were performed for the precursor in the adsorbed...
journal article 2009
document
Van Dorp, W.F. (author)
Work started with a critical review of literature from the past 70-odd years. The review shows that the physical processes occurring in EBID are generally well understood. By combining models for electron scattering in a solid and electron beam induced heating and knowledge of growth regimes, the majority of the experimental results was...
doctoral thesis 2008
document
Van Bruggen, M.J. (author)
The development of a multi-electron beam system is described which is dedicated for electron beam induced deposition (EBID) with sub-10 nm resolution. EBID is a promising mask-less nanolithography technique which has the potential to become a viable technique for the fabrication of 20-2 nm structures after 2013, as described by the International...
doctoral thesis 2008
document
Silvis-Cividjian, N. (author)
doctoral thesis 2002
Searched for: subject:"electron%5C+beam%5C+induced%5C+deposition"
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