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Neeft, Tobias (author)Silicon wafers and solar cells are delicate components used in the semiconductor industries and energy industries. Handling and transportation can easily damage these components. Conventional handling methods with mechanical contact can cause various damages to these delicate surfaces. Air bearings can provide a solution by enabling an almost...master thesis 2023
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Ganjian, M. (author), Modaresifar, K. (author), Rompolas, Dionysios (author), Fratila-Apachitei, E.L. (author), Zadpoor, A.A. (author)Developing high-throughput nanopatterning techniques that also allow for precise control over the dimensions of the fabricated features is essential for the study of cell-nanopattern interactions. Here, we developed a process that fulfills both of these criteria. Firstly, we used electron-beam lithography (EBL) to fabricate precisely...journal article 2022
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Ivančević, Lovro (author)The lack of reliable human physiology models in vitro combined with an ever-increasing set of health and safety requirements imposed by pharmaceutical regulatory agencies across the world is causing a concerningly low number of new drugs to reach the market. Organ-on-Chip (OoC) technology aims to aid faster development of new drugs by providing...master thesis 2021
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Ajroemjan, Wahhe (author)The packaging of a microchip affects its size, performance and cost. With advanced packaging, more efficient and smaller microchips can be produced. For this, advanced packaging stepper systems are used, which are lithography machines with a highly optimized projection lens system, that use a powerful light source. The projection lens system for...master thesis 2021
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Jain, Akash (author)An ever-increasing demand for making microchips smaller and quicker pushes for the advancement of lithography machines. System dynamics plays an important role in determining the performance of a lithography machine. This thesis is aimed to increase the throughput of an electron beam lithography machine, mainly for sparse patterns, by improving...master thesis 2021
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Neelen, Rob (author)Roll-to-Plate (R2P) nanoimprint lithography (NIL) is a fabrication process with the potential for low-cost high-volume fabrication of micro- and nano-patterns on large areas. As a result, R2P is regarded as a promising production process for micro- and nano-scale features which exceed the conventional wafer sizes. In addition, the process has...master thesis 2021
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Leliveld, Robert (author)This thesis describes a study into pairwise particle interactions within a Hele-Shaw geometry, using stop-flow lithography. By exposing a photoreactive mixture to a strong UV-pulse, a hydrogel is formed. The shape of this hydrogel is controlled by masking part of the light beam. This process takes place while the Hele-Shaw channel is placed on...master thesis 2021
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Van Delft, Falco C.M.J.M. (author), Sudalaiyadum Perumal, Ayyappasamy (author), van Langen-Suurling, A.K. (author), de Boer, C.R. (author), Kašpar, Ondřej (author), Tokárová, Viola (author), Dirne, F. (author), Nicolau, Dan V. (author)Non-deterministic polynomial (NP-) complete problems, whose number of possible solutions grows exponentially with the number of variables, require by necessity massively parallel computation. Because sequential computers, such as solid state-based ones, can solve only small instances of these problems within a reasonable time frame, parallel...journal article 2021
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Hari, S. (author), Trompenaars, P. H.F. (author), Mulders, J. J.L. (author), Kruit, P. (author), Hagen, C.W. (author)High resolution dense lines patterned by focused electron beam-induced deposition (FEBID) have been demonstrated to be promising for lithography. One of the challenges is the presence of interconnecting material, which is often carbonaceous, between the lines as a result of the Gaussian line profile. We demonstrate the use of focused electron...journal article 2021
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Singh, Gyanendra (author), Lesne, E.L. (author), Winkler, Dag (author), Claeson, Tord (author), Bauch, Thilo (author), Lombardi, Floriana (author), Caviglia, A. (author), Kalaboukhov, Alexei (author)The interface between two wide band-gap insulators, LaAlO<sub>3</sub> and SrTiO<sub>3</sub> (LAO/STO), hosts a quasi-two-dimensional electron gas (q2DEG), two-dimensional superconductivity, ferromagnetism, and giant Rashba spin-orbit coupling. The co-existence of two-dimensional superconductivity with gate-tunable spin-orbit coupling and...journal article 2021
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Bhardwaj, Shikhar (author)Advancements in the semiconductor manufacturing processes, particularly photo-lithography, contribute to the sustainability goals of the modern society by enabling production of cheaper, more efficient computer chips. This thesis work focused on improvements to a technique called immersion lithography that uses a confined pool of liquid as the...master thesis 2020
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Saraswat, Yug C. (author), Ibis, F. (author), Rossi, L. (author), Sasso, L. (author), Eral, H.B. (author), Fanzio, P. (author)Hypothesis: Our ability to dictate the colloid geometry is intimately related to self-assembly. The synthesis of anisotropic colloidal particles is currently dominated by wet chemistry and lithographic techniques. The wet chemical synthesis offers limited particle geometries at bulk quantities. Lithographic techniques, on the other hand,...journal article 2020
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Lugier, Olivier (author), Troglia, Alessandro (author), Sadegh, Najmeh (author), van Kessel, L.C.P.M. (author), Bliem, Roland (author), Mahne, Nicola (author), Nannarone, Stefano (author), Castellanos, Sonia (author)The semiconductor industry plans to keep fabricating integrated circuits, progressively decreasing there features size, by employing extreme ultraviolet lithography (EUVL). With this method, new designs and concepts for photoresist materials need to be conceived. In this work, we explore an alternative concept to the classic photoresist...journal article 2020
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van der Velden, Gijs (author), Fan, D. (author), Staufer, U. (author)Organ-on-chip (OoC) technology is increasingly used for biomedical research and to speed up the process of bringing a drug from lab to the market. The main fluidic components of an OoC device are microfluidic channels and porous membranes arranged in three dimensions. Current chips are often assembled from several parts. In the development...journal article 2020
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van Kessel, L.C.P.M. (author), Hagen, C.W. (author)Monte Carlo simulations are frequently used to describe electron–matter interaction in the 0–50 keV energy range. It often takes hours to simulate electron microscope images using first-principle physical models. In an attempt to maintain a reasonable speed, empirical models are sometimes used. We present an open-source software package with...journal article 2020
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van der Velden, Gijs (author)Organ-on-chip (OoC) devices are increasingly used for biomedical research and to speed up the process of bringing a medicinal drug from the lab to the market. The technology also addresses ethical issues linked to animal testing as it offers a reduction in animal experiments through its possibility to mimic the environment in the human body....master thesis 2019
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van Assenbergh, S.P. (author), Fokker, Marike (author), Langowski, Julian (author), van Esch, J.H. (author), Kamperman, Marleen (author), Dodou, D. (author)The adhesiveness of biological micropatterned adhesives primarily relies on their geometry (e.g., feature size, architecture) and material properties (e.g., stiffness). Over the last few decades, researchers have been mimicking the geometry and material properties of biological micropatterned adhesives. The performance of these biomimetic...journal article 2019
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Xin, Y. (author), Pandraud, G. (author), Zhang, Y. (author), French, P.J. (author)In this paper, we propose a novel vertical SU-8 waveguide for evanescent analyte sensing. The waveguide is designed to possess a vertical and narrow structure to generate evanescent waves on both sides of the waveguide's surface, aimed at increasing the sensitivity by enlarging the sensing areas. We performed simulations to monitor the...journal article 2019
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Mountain, Christopher (author), Kluba, M.M. (author), Bergers, L.I.J.C. (author), Snijder, Jaap (author), Dekker, R. (author)Accurate alignment between the cavities in cavity-SOI (c-SOI) wafers and lithography on the wafer surface is essential to advanced MEMS production. Existing alignment methods are well defined, but often require specialized equipment or costly software packages available only in professional manufacturing environments. It would be beneficial...journal article 2019
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Puce, Salvatore (author), Sciurti, Elisa (author), Rizzi, Francesco (author), Spagnolo, Barbara (author), Qualtieri, Antonio (author), De Vittorio, Massimo (author), Staufer, U. (author)This work aims at developing a new and unconventional Sacrificial Stencil Mask (SSM) technology by exploiting Two-Photon Polymerization (2PP) in an IP-L/SU-8 double layer resist system. The process consists of the sequential deposition of two different resists, such as SU-8 and IPL, onto the same glass substrate, followed by 2PP lithography...journal article 2019