Ma, X (author), Kato, Y (author), van Kempen, F.C.M. (author), Hirai, Y (author), Tsuchiya, T (author), van Keulen, A. (author), Tabata, O (author) We report a multiple patterning approach utilizing digital-micromirror-device (DMD)-based grayscale lithography, providing a solution to improve fabrication accuracy for entire target three-dimensional structure. Because DMD-based lithography system consists a projection lens system, better resolution can be obtained around focal position...
conference paper 2015
