A study of the reproducibility of electron beam induced deposition for sub-20 nm lithography

The potential of Electron Beam Induced Deposition (EBID) to become a reliable and reproducible direct-write nanopatterning technique has been investigated. A key requirement is that patterns of sub-20 nm dimension can be reproducibly fabricated and measured. EBID was used for the controlled fabrication of sub-20 nm dense lines on bulk silicon...

Pattern transfer into silicon using sub-10 nm masks made by electron beam induced deposition

To demonstrate the possibility of using EBID masks for sub-10 nm pattern transfer into silicon, first experiments were carried out by using 20-40 nm EBID masks, that were etched by different chemistries. It is experimentally verified that recipes based on hydrogen bromide, chlorine and boron trichloride can selectively etch silicon when using 20...