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Ansuinelli, P. (author)The importance of inverse problems is paramount in science and physics because their solution provides information about parameters that cannot be directly observed. This thesis discusses and details the application of a few inverse methods in optical imaging, metrology and inspection of lithographic targets, particularly patterned structures on...doctoral thesis 2022
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Sadeghian Marnani, H. (author), Herfst, R.W. (author), Van den Dool, T.C. (author), Crowcombe, W.E. (author), Winters, J. (author), Kramer, G.F.I.J. (author)Scanning probe microscopy (SPM) is a promising candidate for accurate assessment of metrology and defects on wafers and masks, however it has traditionally been too slow for high-throughput applications, although recent developments have significantly pushed the speed of SPM [1,2]. In this paper we present new results obtained with our...conference paper 2014
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Sadeghian Marnani, H. (author), Van den Dool, T.C. (author), Crowcombe, W.E. (author), Herfst, R.W. (author), Winters, J. (author), Kramer, G.F.I.J. (author), Koster, N.B. (author)With the device dimensions moving towards the 1X node, the semiconductor industry is rapidly approaching the point where 10 nm defects become critical. Therefore, new methods for improving the yield are emerging, including inspection and review methods with sufficient resolution and throughput. Existing industrial tools cannot anymore fulfill...conference paper 2014