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Bezelev, Sawa (author)Future industrial lithography machines will use interferometers for wafer-stage position metrology. Interferometers suffer from phase wrapping, which is why in this thesis an absolute phase detection system has been developed. The absolute phase detection system will use two lasers, with the second laser allowing for limited changes in the...master thesis 2022
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Ansuinelli, P. (author)The importance of inverse problems is paramount in science and physics because their solution provides information about parameters that cannot be directly observed. This thesis discusses and details the application of a few inverse methods in optical imaging, metrology and inspection of lithographic targets, particularly patterned structures on...doctoral thesis 2022
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Soman, S. (author), Pereira, S.F. (author), El Gawhary, O. (author)In recent years, a lot of works have been published that use parameter retrieval using orbital angular momentum (OAM) beams. Most make use of the OAM of different Laguerre-Gauss modes. However, those specific optical beams are paraxial beams and this limits the regime in which they can be used. In this paper, we report on the first results on...journal article 2022
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van Deventer, Oskar (author), Spethmann, Nicolas (author), Loeffler, Marius (author), Amoretti, Michele (author), van den Brink, R.F.M. (author), Bruno, Natalia (author), Kozlowski, W. (author), Neumann, N.M.P. (author), Rol, M.A. (author)The Second Quantum Revolution facilitates the engineering of new classes of sensors, communication technologies, and computers with unprecedented capabilities. Supply chains for quantum technologies are emerging, some focused on commercially available components for enabling technologies and/or quantum-technologies research infrastructures,...review 2022
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Quesson, B. A.J. (author), van Neer, P.L.M.J. (author), Tamer, M. S. (author), Hatakeyama, K. (author), Van Es, M. H. (author), van Riel, M.C.A. (author), Piras, D. (author)The semiconductor industry needs to fit ever more devices per unit area to improve their performance; hence a trend towards increasingly complex structures by varying material combinations and 3D geometries with increasing aspect ratios. The new materials used may be optically opaque, posing problems for traditional optical metrology methods....journal article 2022
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van de Sande, Willem (author)A wavelength modulated interferometer is presented, based on a telecom laser source. A solution for the target distance dependency of wavelength modulated interferometers is presented. With the introduction of a delay line, the modulation depth variation is reduced. A method and a sensor head for the reduction of the thermal dependency of this...master thesis 2021
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Veen, Martijn (author)This report introduces a customized software tool to enable automation of optical inspection optical and SEM images of a superconducting quantum processor during its fabrication. This is achieved by implementing image processing algorithms using the Python package OpenCV. This suite consist of three components; pyclq_base, pyclq_jj, pyclq_ab....bachelor thesis 2021
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Hei, K. (author)Length is one of the fundamental physical quantities and its precise measurement is very important for science and technology. Laser-based distance metrology technique is a powerful tool, which is widely applied in geodetic monitoring, environmental monitoring and precision measurement engineering including in space applications. Since the...doctoral thesis 2021
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Oudejans, Benjamin (author)As quantum computers are developing, they are beginning to become useful for practical applications, for example in the field of quantum metrology. In this work, a variational quantum algorithm is used to find an optimal probe state for measuring parameters in a noisy environment. This is achieved by optimizing a cost on a quantum computer,...bachelor thesis 2021
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Bertrand-Krajewski, Jean-Luc (author), Clemens, F.H.L.R. (author), Lepot, M.J. (author)This introductory chapter indicates why well-defined, high-standard, and reliable monitoring is a key aspect in the necessary evolution of urban drainage and stormwater management and why it should become routine practice. It provides a framework, guidelines, and recommendations to define monitoring objectives and means. It also presents the...book chapter 2021
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This book presents the advancements made in applied metrology in the field of Urban Drainage and Stormwater Management over the past two decades in scientific research as well as in practical applications. Given the broadness of this subject (measuring principles, uncertainty in data, data validation, data storage and communication, design,...book 2021
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Dou, X. (author), Pereira, S.F. (author), Min, Changjun (author), Zhang, Yuquan (author), Meng, P. (author), Urbach, Paul (author), Yuan, Xiaocong (author)The sidewall angle (SWA) of a nanostructure exerts influence on the performance of the nanostructure and plays an important role in processing nano-structural chips. It is still a great challenge to determine steep SWAs from far field measurements especially when the SWAs are close to 90°. Here, we propose a far-field detection system to...journal article 2021
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Rossi, Alessandro (author), Hendrickx, N.W. (author), Sammak, A. (author), Veldhorst, M. (author), Scappucci, G. (author), Kataoka, Masaya (author)Single-charge pumps are the main candidates for quantum-based standards of the unit ampere because they can generate accurate and quantized electric currents. In order to approach the metrological requirements in terms of both accuracy and speed of operation, in the past decade there has been a focus on semiconductor-based devices. The use of...journal article 2021
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van Rooij, J. (author)Optical imaging is the imaging of objects with visible light. It is a tool often used for diagnostic purposes, such as in biomedical and material sciences. Digital holography is an optical imaging technique that captures and images the amplitude as well as the phase (the complex amplitude) of the lightwave. An advantage is that the complex...doctoral thesis 2020
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van Kessel, L.C.P.M. (author), Huisman, T. (author), Hagen, C.W. (author)Line-edge roughness (LER) is often measured from top-down critical dimension scanning electron microscope (CD-SEM) images. The true three-dimensional roughness profile of the sidewall is typically ignored in such analyses. We study the response of a CD-SEM to sidewall roughness (SWR) by simulation. We generate random rough lines and spaces,...conference paper 2020
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van Kessel, L.C.P.M. (author), Hagen, C.W. (author)Monte Carlo simulations are frequently used to describe electron–matter interaction in the 0–50 keV energy range. It often takes hours to simulate electron microscope images using first-principle physical models. In an attempt to maintain a reasonable speed, empirical models are sometimes used. We present an open-source software package with...journal article 2020
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van Kessel, L.C.P.M. (author), Huisman, T.A. (author), Hagen, Cornelis W. (author)Background: Line-edge roughness (LER) is often measured from top-down critical dimension scanning electron microscope (CD-SEM) images. The true three-dimensional roughness profile of the sidewall is typically ignored in such analyses. Aim: We study the response of a CD-SEM to sidewall roughness (SWR) by simulation. Approach: We generate...journal article 2020
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Ansuinelli, P. (author), Coene, W.M.J.M. (author), Urbach, Paul (author)EUV lithography is the main candidate for patterning of future technology nodes. Its successful implementation depends on many aspects, among which the availability of actinic mask metrology tools able to inspect the patterned absorber in order to control and monitor the lithographic process. In this work, we perform a simulation study to...conference paper 2019
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Hei, K. (author), Shi, Guang (author), Hänsel, A. (author), Deng, Z. (author), Latkowski, Sylwester (author), Van Den Berg, Steven A. (author), Bente, Erwin (author), Bhattacharya, N. (author)The measurement of distance plays an integral part in many aspects of modern societies. In this paper an integrated mode-locked laser on a chip is used for distance measurement based on mode-resolved interferometry. The emission from the on-chip source with a repetition rate of 2.5 GHz and a spectral bandwidth of 3 nm is coupled into a...journal article 2019
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Zucca, Mauro (author), Bottauscio, Oriano (author), Harmon, Stuart (author), Guilizzoni, Roberta (author), Schilling, Florian (author), Schmidt, Matthias (author), Ankarson, Peter (author), Bauer, P. (author), Dong, J. (author)The European Union funded project MICEV aims at improving the traceability of electrical and magnetic measurement at charging stations and to better assess the safety of this technology with respect to human exposure. The paper describes some limits of the instrumentation used for electrical measurements in the charging stations, and briefly...conference paper 2019