Khalili Amiri, P. (author), Zhuang, Y. (author), Schellevis, H. (author), Rejaei, B. (author), Vroubel, M. (author), Ma, Y. (author), Burghartz, J.N. (author) This work presents a series of high-resistivity nanogranular Co–Al–O films with maximum resistivity of ? 110?m??cm. The films were deposited using pulsed dc reactive sputtering of a Co72Al28 target in an oxygen/argon ambient. The samples were characterized by scanning electron microscopy (SEM), M-H loop measurements, and s-parameter measurements...
journal article 2007
