WC

Wei Chih Cheng

2 records found

Authored

Digital etching is an effective method to lower dry etch damages in A1GaN/GaN HEMTs. This work systematically investigated O2-plasma-based digital etching of AlGaN and p-GaN. AlN layers were used as the etch stop layers in the AlGaN etch. Important process aspects s ...

O2 plasma-based digital etching of Al0.25Ga0.75N with a 0.8 nm AlN spacer on GaN was investigated using an inductively coupled plasma etcher. Silicon oxide layer was used as the hard mask. At 40 W RF bias power and 40 sccm oxygen flow, the etch ...