Accelerating Computational Electromagnetic Diffraction Model on Programmable Graphics Processors

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Abstract

This thesis is done in the framework of wafer metrology to accelerate an electromagnetic diffraction model (EDM), which is used to measure the profile on a wafer, on programmable graphics processors (GPU). The main focus of this thesis is to investigate the suitability of EDM to GPU architectures. This study contributes with statistical data and benchmark of certain parts of the application, showing its bottlenecks and pointing out interesting places to optimize the performance, which turned into finding other strategies of parallelizing.