Improvement of contact resistances on plasma-exposed silicon carbide.
Journal Article
(2000)
Author(s)
R Cheung (External organisation)
J Hay (External organisation)
Emile van der Drift (TU Delft - QN/Kavli Nanolab Delft)
W. Gao (External organisation)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:2796fb31-9ddb-485b-937d-037aa55b3f28
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Publication Year
2000
Research Group
QN/Kavli Nanolab Delft
Issue number
12
Volume number
44
Pages (from-to)
2081-2083
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