Inductively coupled plasma etching of GaN and its effect ton electrical characteristics.
Journal Article
(2001)
Authors
B Rong (TU Delft - QN/Kavli Nanolab Delft)
EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)
RJ Reeves (External organisation)
W. G. Sloof (OLD Virtual Materials and Mechanics)
R Cheung (External organisation)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/72c5c704-5e3e-40ee-a36c-d8b5222262fc
More Info
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Publication Year
2001
Research Group
QN/Kavli Nanolab Delft
Volume number
19
Pages (from-to)
2917-2920
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