A novel method to prevent pattern rotation in anisotropic wet etch
Conference Paper
(2008)
Author(s)
C. Shen (TU Delft - Electronic Components, Technology and Materials)
TMH Pham (TU Delft - Old - EWI Sect. ECTM)
Ronald Dekker (TU Delft - Electronic Components, Technology and Materials)
P. M. Sarro (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://resolver.tudelft.nl/uuid:84733c0d-fbfa-425e-986b-c680c587ae2b
More Info
expand_more
expand_more
Publication Year
2008
Research Group
Electronic Components, Technology and Materials
Pages (from-to)
944-950
ISBN (print)
978-909023470
No files available
Metadata only record. There are no files for this record.