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Showing 1 to 16 of 16 found. | Sort by date

1 Deposition, milling, and etching with a focused helium ion beam
bookPart 2012    
Author: Alkemade, P.F.A. · Veldhoven, E. van
Keywords: Nanotechnology · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[Abstract]

2 Is helium ion beam induced processing applicable to EUV mask repair?
article 2012    
Author: Maas, D.J. · Bekman, H.H.P.T. · Veldhoven, E. van · Alkemade, P.F.A.
Keywords: Chemistry · helium ion microscopy · ion beam induced processing · EUV mask repair · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences

3 Impact of pixel-dose optimization on pattern fidelity for helium ion beam lithography on EUV resist
article 2015    
Author: Kalhor, N. · Mulckhuyse, W.F.W. · Alkemade, P.F.A. · Maas, D.J.
Keywords: Nanotechnology · Scanning helium ion beam lithography · EUV lithography · Chemically amplified resist · Metrology · Dose optimization modeling · Ion shot noise · Critical dimension · Line-width roughness · High Tech Systems & Materials · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[PDF] [Abstract]

4 Imaging and nanofabrication with the helium ion microscope of the Van Leeuwenhoek Laboratory in Delft
article 2012    
Author: Alkemade, P.F.A. · Koster, E.M. · Veldhoven, E. van · Maas, D.J.
Keywords: Image processing · focused ion beam · ion milling · metrology · biological microanalysis · imaging · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[Abstract]

5 Model for nanopillar growth by focused helium ion-beam-induced deposition
article 2010    
Author: Alkemade, P.F.A. · Chen, P. · Veldhoven, E. van · Maas, D.J.
[Abstract]

6 Helium ion beam induced growth of hammerhead AFM probes
article 2015    
Author: Nanda, G. · Veldhoven, E. van · Maas, D.J. · Sadeghian Marnani, H. · Alkemade, P.F.A.
Keywords: Physics · Atomic force microscopy · Carbon · Ion beams · Ions · Nanoneedles · Beam-induced deposition · Fabrication process · Growth stages · Helium ion beams · Line Edge Roughness · Precise control · Sidewall angles · Three dimensions · Probes · High Tech Systems & Materials · Industrial Innovation · Nano Technology · NI - Nano Instrumentation · TS - Technical Sciences
[Abstract]

7 Beam induced deposition of platinum using a helium ion microscope
article 2009    
Author: Sanford, C.A. · Stern, L. · Barriss, L. · Farkas, L. · DiManna, M. · Mello, R. · Maas, D.J. · Alkemade, P.F.A.
[Abstract]

8 Pulsed helium ion beam induced deposition: a means to high growth rates
article 2011    
Author: Alkemade, P.F.A. · Miro, H. · Veldhoven, E. van · Maas, D.J. · Smith, D.A. · Rack, P.D.
Keywords: Chemistry · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[Abstract]

9 Nano-engineering with a focused helium ion beam
article 2011    
Author: Maas, D.J. · Drift, E.W. van der · Veldhoven, E. van · Meessen, J. · Rudneva, M. · Alkemade, P.F.A.
Keywords: Physics · High Tech Systems & Materials · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[Abstract]

10 Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist
article 2009    
Author: Sidorkin, V.A. · Alkemade, P.F.A. · Salemink, H.W.M. · Schmits, R. · Drift, E. van der
[Abstract]

11 Helium ion beam lithography of thick HSQ resists
article 2012    
Author: Alkemade, P.F.A. · Langen-Suurling, A.K. van · Drift, E. van der · Veldhoven, E. van · Maas, D.J.
Keywords: Chemistry · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[Abstract]

12 Evaluation of EUV resist performance below 20nm CD using helium ion lithography
article 2014    
Author: Maas, D.J. · Veldhoven, E. van · Langen-Suurling, A. van · Alkemade, P.F.A. · Wuister, S. · Hoefnagels, R. · Verspaget, C. · Meessen, J. · Fliervoet, T.
Keywords: Nanotechnology · Energy transfer · EUV lithography · EUV resist characterization · Helium Ion Microscope · Lithography · Proximity effect · Scanning Helium Ion Beam Lithography · Electron beam lithography · Extreme ultraviolet lithography · Proximity correction · High Tech Systems & Materials · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[PDF] [Abstract]

13 Evaluation of EUV resist performance below 20nm CD using helium ion lithography
report 2014    
Author: Maas, D.J. · Veldhoven, E. van · Pohlmann, R.C.M. · Langen-Suurling, A. van · Alkemade, P.F.A. · Wulster, S. · Hoefnagels, R. · Verspaget, C. · Meessen, J. · Fliervoet, T.
Keywords: Nanotechnology · Energy transfer · EUV lithography · EUV resist characterization · Helium Ion Microscope · Lithography · Proximity effect · Scanning Helium Ion Beam Lithography · Electron beam lithography · Extreme ultraviolet lithography · Proximity correction · High Tech Systems & Materials · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[PDF]

14 Nanopillar growth by focused helium ion-beam-induced deposition
article 2010    
Author: Chen, P. · Veldhoven, E. van · Sanford, C.A. · Salemink, H.W.M. · Maas, D.J. · Smith, D.A. · Rack, P.D. · Alkemade, P.F.A.
Keywords: Nanotechnology · Beam diameters · Beam impact · Current dependence · Deposition efficiencies · Deposition process · Dominant mechanism · Electronic excitation · Experimental observation · Helium ion beams · High growth rate · Lateral growth · Lateral outgrowths · Low beam · Monte Carlo Simulation · Nanopillars · Precursor molecules · Primary ions · Secondary electrons · Sharp tip · Silicon substrates · Simulation result · Computer simulation · Monte Carlo methods · Platinum · Platinum compounds · Secondary emission · Superconducting materials · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[Abstract]

15 Enhancing re-detection efficacy of defects on blank wafers using stealth fiducial markers
article 2016    
Author: Bouwens, M.A.J. · Maas, D.J. · Donck, J.C.J. van der · Alkemade, P.F.A. · Walle, P. van der
Keywords: Nanotechnology · High Tech Systems & Materials · Industrial Innovation · Nano Technology · NI - Nano Instrumentation · TS - Technical Sciences
[Abstract]

16 Deep sub-wavelength metrology for advanced defect classification
article 2017    
Author: Walle, P. van der · Kramer, E. · Donck, J.C.J. van der · Mulckhuyse, W.F.W. · Nijsten, L. · Bernal Arango, F.A. · Jong, A. de · Zeijl, E. van · Spruit, H.E.T. · Berg, J.H. van den · Nanda, G. · Langen-Suurling, A.K. van · Alkemade, P.F.A. · Pereira, S.F. · Maas, D.J.
Keywords: Nanotechnology · Particle contamination · Defect detection · Defect review · Advanced defect classification · Semiconductor · Latex sphere equivalent · Dark field microscopy · Speckle · High Tech Systems & Materials · Industrial Innovation · Nano Technology · NI - Nano Instrumentation OPT - Optics · TS - Technical Sciences
[PDF] [Abstract]

Search results also available in MS Excel format.

Showing 1 to 16 of 16 found. | Sort by date