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1 Investigating the intrinsic cleanliness of automated handling designed for EUV mask Pod-in-Pod systems
article 2011    
Author: Brux, O. · Walle, P. van der · Donck, J.C.J. van der · Dress, P.
Keywords: Electronics · Dual Pod System · EIP · EUV mask · Exchange Port · Intrinsic cleanliness · MTPro InSync · Pod-in-Pod interface · PRP · RapidNano Scanner · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[PDF] [Abstract]

2 Particle qualification procedure for the TNO EUV reticle load port module of the HamaTech MaskTrackPro cleaning tool
article 2011    
Author: Stortelder, J.K. · Donck, J.C.J. van der · Oostrom, S. · Walle, P. van der · Brux, O. · Dress, P.
Keywords: Physics · EUV reticles · particles · qualification · reticle handling · reticle load port · statistics · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[Abstract]

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