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Showing 1 to 6 of 6 found. | Sort by date

1 A tip / tilt mirror with large dynamic range for the ESO VLT Four Laser Guide Star Facility
article 2011    
Author: Rijnveld, N. · Henselmans, R. · Nijland, B.A.H.
Keywords: Electronics · Adaptive Optics · Field Selector · Laser Guide Star · Mechatronics · OTA · Tip/tilt mirror · VLT · Field Selector · Laser Guide Star · OTA · Tip/tilt mirror · VLT · Inductive sensors · Jitter · Optical telescopes · Sensors · Stars · Mirrors · High Tech Systems & Materials · Industrial Innovation · Mechatronics, Mechanics & Materials · OM - Opto-Mechatronics · TS - Technical Sciences
[PDF] [Abstract]

2 Ultra stable iso-static bonded optical mount design for harsh environments
lecture 2012    
Author: Pijnenburg, J. · Voert, M.J.A. te · Vreugd, J. de · Vosteen, A. · Werkhoven, W. van · Mekking, J. · Nijland, B.A.H.
Keywords: Electronics · Adhesives · Cryogenic environment · Optical mount design · Optomechanics · Pointing stability · Wave front error · High Tech Systems & Materials · Industrial Innovation · Mechatronics, Mechanics & Materials · OM - Opto-Mechatronics · TS - Technical Sciences
[PDF] [Abstract]

3 Ultra stable iso-static bonded optical mount design for harsh environments
article 2012    
Author: Pijnenburg, J. · Voert, M.J.A. te · Vreugd, J. de · Vosteen, A. · Werkhoven, W. van · Mekking, J. · Nijland, B.A.H.
Keywords: Electronics · Adhesives · Cryogenic environment · Optical mount design · Optomechanics · Pointing stability · Wave front error · High Tech Systems & Materials · Industrial Innovation · Mechatronics, Mechanics & Materials · OM - Opto-Mechatronics · TS - Technical Sciences
[PDF] [Abstract]

4 First light and results on EBL2
article 2017    
Author: Koster, N.B. · Sligte, E. te · Deutz, A.F. · Molkenboer, F.T. · Muilwijk, P.M. · Walle, P. van der · Mulckhuyse, W.F.W. · Nijland, B.A.H. · Kerkhof, P.J. · Putten, M. van
Keywords: Electronics · Contamination control · EUV exposure · Handling · Mask · Metrology · Pellicle · XPS analysis · High Tech Systems & Materials · Industrial Innovation · Nano Technology · NI - Nano Instrumentation · TS - Technical Sciences
[PDF] [Abstract]

5 EBL2: high power EUV exposure facility
article 2016    
Author: Sligte, E. te · Koster, N.B. · Molkenboer, F.T. · Walle, P. van der · Muilwijk, P.M. · Mulckhuyse, W.F.W. · Oostdijck, B.W. · Hollemans, C.L. · Nijland, B.A.H. · Kerkhof, P.J. · Putten, M. van · Hoogstrate A.M. · Deutz, A.F.
Keywords: Electronics · EUVL mask · EUV exposure · EUVL pellicle · EUV metrology · Lifetime research · High Tech Systems & Materials · Industrial Innovation · Nano Technology · NI - Nano Instrumentation OM - Opto-Mechatronics · TS - Technical Sciences
[Abstract]

6 First light on EBL2
article 2017    
Author: Koster, N.B. · Sligte, E. te · Molkenboer, F.T. · Deutz, A.F. · Walle, P. van der · Muilwijk, P.M. · Mulckhuyse, W.F.W. · Oostdijck, B.W. · Hollemans, C.L. · Nijland, B.A.H. · Kerkhof, P.J. · Putten, M. van · Westerhout, J.
Keywords: Electronics · EUV exposure · Mask · Pellicle · XPS analysis · Metrology · Handling · Contamination control · High Tech Systems & Materials · Industrial Innovation · Nano Technology · NI - Nano Instrumentation SSE - Space Systems Engineering OM - Opto-Mechatronics · TS - Technical Sciences
[PDF] [Abstract]

Search results also available in MS Excel format.

Showing 1 to 6 of 6 found. | Sort by date