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Showing 1 to 9 of 9 found. | Sort by date

1 Enhancing re-detection efficacy of defects on blank wafers using stealth fiducial markers
article 2016    
Author: Bouwens, M.A.J. · Maas, D.J. · Donck, J.C.J. van der · Alkemade, P.F.A. · Walle, P. van der
Keywords: Nanotechnology · High Tech Systems & Materials · Industrial Innovation · Nano Technology · NI - Nano Instrumentation · TS - Technical Sciences
[Abstract]

2 Kinetics of reduction of a RuO2(110) film on Ru(0001) by atomic hydrogen
article 2013    
Author: Ugur, D. · Storm, A.J. · Verberk, R. · Brouwer, J.C. · Sloof, W.G.
Keywords: Physics · Atomic hydrogen · EUVL · Mitigation · RuO2 · High Tech Systems & Materials · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[Abstract]

3 Foil-to-foil lamination and electrical interconnection of printed components on flexible substrates
article 2013    
Author: Vásquez Quintero, A. · Remoortere, B. van · Smits, E.C.P. · Brand, J. van den · Briand, D. · Schoo, H.F.M. · Rooij, N.F. de
Keywords: Electronics · (ACA/ICA) · Anisotropic/isotropic conductive adhesives · Cyclic bending tests · Environmental ageing · Foil-based humidity sensing · Foil-to-foil interconnection · Low-temperature lamination · (ACA/ICA) · Conductive adhesive · Cyclic bending tests · Environmental ageing · Foil-to-foil interconnection · Humidity sensing · Low temperatures · Humidity sensors · Laminating · Adhesive joints · High Tech Systems & Materials · Industrial Innovation · Mechatronics, Mechanics & Materials · HOL - Holst · TS - Technical Sciences
[Abstract]

4 Surface metrology of 150 mm substrate with nanometer accuracy with the Philips beamwriter
article 1989    
Author: Verheijen, M.J. · Fontijn, L.A.
[Abstract]

5 Comparison of extreme ultraviolet sources for lithography applications
article 2000    
Author: Banine, V.Y. · Benschop, J.P.H. · Werij, H.G.C.
Keywords: Graph theory · Laser produced plasmas · Mirrors · Multilayers · Optics · Silicon wafers · Extreme ultraviolet lithography · Gas discharge · Projection multilayer optics · Resists sensitivity · Synchrotron Wiggler · Photoresists
[Abstract]

6 Mitigation of surface contamination from resist outgassing in EUV lithography
article 2000    
Author: Mertens, B.M. · Zwan, B. van der · Jager, P.W.H. de · Leenders, M. · Werij, H.G.C. · Benschop, J.P.H. · Dijsseldonk, A.J.J. van
Keywords: Computer simulation · Degassing · Flow of fluids · Light absorption · Masks · Numerical methods · Optical coatings · Extreme ultraviolet lithography · Gas lock system · Hydrocarbon contamination · Surface contamination · Photoresists
[Abstract]

7 Flexible electronics : Prediction of substrate deformation during different steps of the lithography process
article 2011    
Author: Barink, M. · Berg, D. van den · Yakimets, I. · Giesen, P. · Dommelen, J.A.W. van · Meinders, E.R.
Keywords: Materials · Flexible electronics · Flexible substrate · Freestanding · Lithography · Polymer film · Processing · Thermo-hygro-mechanical model · High Tech Systems & Materials · Industrial Innovation · Mechatronics, Mechanics & Materials · HOL - Holst · TS - Technical Sciences
[Abstract]

8 Roll-to-roll UV imprint lithography for flexible electronics
article 2011    
Author: Maury, P. · Turkenburg, D.H. · Stroeks, N. · Giesen, P. · Barbu, I. · Meinders, E.R. · Bremen, A. van · Iosad, N. · Werf, R. van der · Onvlee, H.
Keywords: Electronics · Flexible electronics · Imprint · Roll-to-roll · Mechatronics, Mechanics & Materials · HOL - Holst · TS - Technical Sciences
[Abstract]

9 MIM in 3D: dream or reality?
article 2011    
Author: Klootwijk, J.H. · Jinesh, K.B. · Roozeboom, F.
Keywords: Electronics · 3D structures · Breakdown voltage · Capacitance density · High-k · Rare earth materials · Industrial Innovation · Mechatronics, Mechanics & Materials · EAM - Equipment for Additive Manufacturing · TS - Technical Sciences
[Abstract]

Search results also available in MS Excel format.

Showing 1 to 9 of 9 found. | Sort by date