Repository hosted by TU Delft Library

Home · Contact · About · Disclaimer ·
 

Search results also available in MS Excel format.

Showing 1 to 1 of 1 found. | Sort by date

1 EUV blank defect and particle inspection with high throughput immersion AFM with 1nm 3D resolution
article 2016    
Author: Es, M.H. van · Sadeghian Marnani, H.
Keywords: AFM · EUV mask · Massively parallel · Throughput · Atomic force microscopy · Nanocantilevers · Photomasks · Substrates · Surface topography · Units of measurement · 3D resolution · High throughput · Measurement bandwidth · Oscillation amplitude · Surface characterization · Target application · Process control · High Tech Systems & Materials · Industrial Innovation · Nano Technology · OM - Opto-Mechatronics · TS - Technical Sciences
[PDF] [Abstract]

Search results also available in MS Excel format.

Showing 1 to 1 of 1 found. | Sort by date