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Showing 1 to 11 of 11 found. | Sort by date

1 Nanometre-accurate form measurement machine for E-ELT M1 segments
article 2015    
Author: Bos, A. · Henselmans, R. · Rosielle, P.C.J.N. · Steinbuch, M.
Keywords: Nanotechnology · Giant telescopes · Ground-based astronomy · Large Telescope (E-ELT) · Measurement machines · NANOMEFOS · Non-contact · Segment metrology · Bearings (machine parts) · Machine design · Silicon carbide · Sintered carbides · Sintering · Units of measurement · Uncertainty analysis · High Tech Systems & Materials · Industrial Innovation · Mechanics, Materials and Structures · OM - Opto-Mechatronics · TS - Technical Sciences
[Abstract]

2 Gaia on-board metrology: basic angle and best focus
article 2014    
Author: Mora, A. · Biermann, M. · Brown, A.G.A. · Busonero, D. · Carminati, L. · Carrasco, J.M. · Chassat, F. · Erdmann, M. · Gielesen, W.L.M. · Jordi, C. · Katz, D. · Kohley, R. · Lindegren, L. · Loeffler, W. · Marchal, O. · Panuzzo, P. · Seabroke, G. · Sahlmann, J. · Serpell, E. · Serraller, I. · Leeuwen, F. van · Reeven, W. van · Dool, T.C. van den · Vosteen, L.L.A.
Keywords: Electronics · Astrometry · Basic angle monitor · Centroid · Cramér-Rao · Gaia · Interferometry · Metrology · Shack-Hartmann · Spectral resolution · Wavefront reconstruction · Wavefront sensor · Millimeter waves · Silicon carbide · Space telescopes · Spectral resolution · Units of measurement · Adaptive optics · High Tech Systems & Materials · Industrial Innovation · Mechanics, Materials and Structures · OM - Opto-Mechatronics · TS - Technical Sciences
[PDF] [Abstract]

3 Comparison of asphere measurements by tactile and optical metrological instruments
article 2015    
Author: Bergmans, R.H. · Nieuwenkamp, H.J. · Kok, G.J.P. · Blobel, G. · Nouira, H. · Küng, A. · Baas, M. · Voert, M.J.A. te · Baer, G. · Stuerwald, S.
Keywords: Electronics · Nano-metrology · Micro-metrology · Coordinate measuring machines · Imaging techniques · Optical data processing · Units of measurement · Aspheres · Comparison measurement · Measurement strategies · Measuring instruments · Optical measuring instrument · Topography measurement · Very large telescope · High Tech Systems & Materials · Industrial Innovation · Nano Technology · OM - Opto-Mechatronics · TS - Technical Sciences
[Abstract]

4 Characterizing electron beam induced damage in metrology and inspection of advance devices
article 2017    
Author: Mohtashami, A. · Navarro, V. · Sadeghian Marnani, H. · Englard, I. · Shemesh, D. · Malik, N.S.
Keywords: Electronics · Chemical mechanical polishing · Chemical polishing · Electron beams · Hydrophobicity · Semiconductor device manufacture · Silicon wafers · Units of measurement · 300-mm silicon wafers · E-beam damage · High resolution · Low-k materials · Optical metrology techniques · Scanning probe microscopy techniques · Semiconductor industry · Semiconductor manufacturing · Scanning probe microscopy · Nano Technology · OM - Opto-Mechatronics · TS - Technical Sciences

5 Sub 20nm particle inspection on EUV mask blanks
article 2016    
Author: Bussink, P.G.W. · Volatier, J.B. · Walle, P. van der · Fritz, E.C. · Donck, J.C.J. van der
Keywords: Electronics · Defects · Inspection equipment · Nanoparticles · Nanosystems · Photomasks · Units of measurement · Dark field imaging · Dark field microscopy · Diffraction limited · Inspection sensitivities · Inspection system · Pulsed laser sources · Scattering process · Shorter wavelength · Process control · High Tech Systems & Materials · Industrial Innovation · Nano Technology · OPT - Optics · TS - Technical Sciences
[PDF] [Abstract]

6 Non-contact distance measurement and profilometry using thermal near-field radiation towards a high resolution inspection and metrology solution
article 2016    
Author: Bijster, R.J.F. · Sadeghian Marnani, H. · Keulen, F. van
Keywords: Electronics · High resolution inspection · Thermal microscopy · Lenses · Profilometry · Uncertainty analysis · Units of measurement · Near field radiation · Optical near field · Optical performance · Sensitive calorimeter · Solid immersion lens · Process control · High Tech Systems & Materials · Industrial Innovation · Nano Technology · OM - Opto-Mechatronics · TS - Technical Sciences
[PDF] [Abstract]

7 Simultaneous AFM nano-patterning and imaging for photomask repair
article 2016    
Author: Keyvani, A. · Tamer, M.S. · Es, M.H. van · Sadeghian Marnani, H.
Keywords: Electronics · AFM · Nano-Machining · Nano-Scribing · Photomask Repair · Tip-sample interactions · Atomic force microscopy · Photomasks · Repair · Units of measurement · Excitation frequency · High resolution · Imaging process · Nano-Scribing · Nanomachining · NanoPatterning · Photomask repair · Tip-sample interaction · Process control · Nano Technology · OM - Opto-Mechatronics · TS - Technical Sciences
[PDF] [Abstract]

8 Large dynamic range Atomic Force Microscope for overlay improvements
article 2016    
Author: Kuiper, S. · Fritz, E.C. · Crowcombe, W.E. · Liebig, T. · Kramer, G.F.I. · Witvoet, G. · Duivenvoorde, T. · Overtoom, A.J. · Rijnbeek, R.A. · Zwet, E.J. van · Dijsseldonk, A. van · Boef, A. den · Beems, M. · Levasier, L.
Keywords: Electronics · AFM · Atomic Force Microscopy · Overlay · Scanning probe microscopy · SPM · Aspect ratio · Semiconductor devices · Silicon wafers · Uncertainty analysis · Units of measurement · Alignment sensors · Functional devices · High aspect ratio · Optical diffractions · Position and orientations · Relative distances · Process control · High Tech Systems & Materials · Industrial Innovation · Nano Technology · OM - Opto-Mechatronics · TS - Technical Sciences
[PDF] [Abstract]

9 EUV blank defect and particle inspection with high throughput immersion AFM with 1nm 3D resolution
article 2016    
Author: Es, M.H. van · Sadeghian Marnani, H.
Keywords: AFM · EUV mask · Massively parallel · Throughput · Atomic force microscopy · Nanocantilevers · Photomasks · Substrates · Surface topography · Units of measurement · 3D resolution · High throughput · Measurement bandwidth · Oscillation amplitude · Surface characterization · Target application · Process control · High Tech Systems & Materials · Industrial Innovation · Nano Technology · OM - Opto-Mechatronics · TS - Technical Sciences
[PDF] [Abstract]

10 In-line height profiling metrology sensor for zero defect production control
article 2017    
Author: Snel, R. · Winters, J. · Liebig, T. · Jonker, W.A.
Keywords: Electronics · Defects · Delay control systems · Optical data processing · Optical testing · Optical variables measurement · Production control · Sensors · Time delay · Units of measurement · Advanced manufacturing · Height profiling · In-line metrology · Industry4.0 · Zero defects · Process control · High Tech Systems & Materials · Industrial Innovation · Nano Technology · OM - Opto-Mechatronics · TS - Technical Sciences
[PDF] [Abstract]

11 Characterization of EBL2 EUV exposure facility
article 2017    
Author: Sligte, E. te · Putten, M. van · Molkenboer, F.T. · Walle, P. van der · Muilwijk, P.M. · Koster, N.B. · Westerhout, J. · Kerkhof, P.J. · Oostdijck, B.W. · Mulckhuyse, W.F.W. · Deutz, A.F.
Keywords: Contamination control · EUV exposure · Handling · Metrology · Pellicle · XPS analysis · Extreme ultraviolet lithography · Masks · Measurements · Position control · Surface analysis · Units of measurement · XPS analysis · X-ray photoelectron spectroscopy · High Tech Systems & Materials · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[PDF] [Abstract]

Search results also available in MS Excel format.

Showing 1 to 11 of 11 found. | Sort by date