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1 EBL2: high power EUV exposure facility
article 2016    
Author: Sligte, E. te · Koster, N.B. · Molkenboer, F.T. · Walle, P. van der · Muilwijk, P.M. · Mulckhuyse, W.F.W. · Oostdijck, B.W. · Hollemans, C.L. · Nijland, B.A.H. · Kerkhof, P.J. · Putten, M. van · Hoogstrate A.M. · Deutz, A.F.
Keywords: Electronics · EUVL mask · EUV exposure · EUVL pellicle · EUV metrology · Lifetime research · High Tech Systems & Materials · Industrial Innovation · Nano Technology · NI - Nano Instrumentation OM - Opto-Mechatronics · TS - Technical Sciences
[Abstract]

2 First light and results on EBL2
article 2017    
Author: Koster, N.B. · Sligte, E. te · Deutz, A.F. · Molkenboer, F.T. · Muilwijk, P.M. · Walle, P. van der · Mulckhuyse, W.F.W. · Nijland, B.A.H. · Kerkhof, P.J. · Putten, M. van
Keywords: Electronics · Contamination control · EUV exposure · Handling · Mask · Metrology · Pellicle · XPS analysis · High Tech Systems & Materials · Industrial Innovation · Nano Technology · NI - Nano Instrumentation · TS - Technical Sciences
[PDF] [Abstract]

3 EBL2, a flexible, controlled EUV exposure and surface analysis facility
article 2016    
Author: Sligte, E. te · Koster, N.B. · Molkenboer, F.T. · Deutz, A.F.
Keywords: Electronics · EUV exposure · Mask pellicle · XPS analysis · Metrology handling · High Tech Systems & Materials · Industrial Innovation · Nano Technology · NI - Nano Instrumentation · TS - Technical Sciences
[PDF] [Abstract]

4 First light on EBL2
article 2017    
Author: Koster, N.B. · Sligte, E. te · Molkenboer, F.T. · Deutz, A.F. · Walle, P. van der · Muilwijk, P.M. · Mulckhuyse, W.F.W. · Oostdijck, B.W. · Hollemans, C.L. · Nijland, B.A.H. · Kerkhof, P.J. · Putten, M. van · Westerhout, J.
Keywords: Electronics · EUV exposure · Mask · Pellicle · XPS analysis · Metrology · Handling · Contamination control · High Tech Systems & Materials · Industrial Innovation · Nano Technology · NI - Nano Instrumentation SSE - Space Systems Engineering OM - Opto-Mechatronics · TS - Technical Sciences
[PDF] [Abstract]

5 Characterization of EBL2 EUV exposure facility
article 2017    
Author: Sligte, E. te · Putten, M. van · Molkenboer, F.T. · Walle, P. van der · Muilwijk, P.M. · Koster, N.B. · Westerhout, J. · Kerkhof, P.J. · Oostdijck, B.W. · Mulckhuyse, W.F.W. · Deutz, A.F.
Keywords: Contamination control · EUV exposure · Handling · Metrology · Pellicle · XPS analysis · Extreme ultraviolet lithography · Masks · Measurements · Position control · Surface analysis · Units of measurement · XPS analysis · X-ray photoelectron spectroscopy · High Tech Systems & Materials · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[PDF] [Abstract]

Search results also available in MS Excel format.

Showing 1 to 5 of 5 found. | Sort by date