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Showing 1 to 6 of 6 found. | Sort by date

1 Real-time focus and overlay measurement by the use of fluorescent markers (poster)
lecture 2014    
Author: Maas, D.J. · Zwet, E.J. van
Keywords: Electronics · OVL control · Reticle layout · EUV lithography · High Tech Systems & Materials · Industrial Innovation · Physics & Electronics Mechanics, Materials and Structures · NI - Nano Instrumentation OM - Opto-Mechatronics · TS - Technical Sciences
[PDF]

2 Progress in EUV optics lifetime expectations
article 2004    
Author: Mertens, B.M. · Weiss, M. · Meiling, H. · Klein, R. · Louis, E. · Kurt, R. · Wedowski, M. · Trenkler, H. · Wolschrijn, B.T. · Jansen, R. · Runstraat, A. van de · Moors, R. · Spee, C.I.M.A. · Plöger, S. · Kruijs, R. van de
Keywords: Cap layers · Carbon growth · EUV lithography · Optics lifetime · Oxidation · Auger electron spectroscopy · Crack initiation · Hydrocarbons · Imaging techniques · Lithography · Microoptics · Mirrors · Optical systems · Optics lifetime · Ultraviolet radiation
[Abstract]

3 EBL2 an EUV (Extreme Ultra-Violet) lithography beam line irradiation facility
article 2019    
Author: Bekman, H.H.P.T. · Dekker, M.F. · Ebeling, R.P. · Janssen, J.P.B. · Koster, N.B. · Meijlink, J.R. · Molkenboer, F.T. · Nicolai, K. · Putten, M. van · Rijnsent, C.G.J. · Storm, A.J. · Stortelder, J.K. · Wu, C.C. · Zanger, R.M.S. de
Keywords: EUV lithography · EUV irradiation facility · EUV material interactions · Pellicles · EUV photomask · EUV photomask absorbers · EUV mirror · EUV sensor · Optical lifetime studies · High Tech Systems & Materials · Industrial Innovation
[Abstract]

4 Impact of pixel-dose optimization on pattern fidelity for helium ion beam lithography on EUV resist
article 2015    
Author: Kalhor, N. · Mulckhuyse, W.F.W. · Alkemade, P.F.A. · Maas, D.J.
Keywords: Nanotechnology · Scanning helium ion beam lithography · EUV lithography · Chemically amplified resist · Metrology · Dose optimization modeling · Ion shot noise · Critical dimension · Line-width roughness · High Tech Systems & Materials · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[PDF] [Abstract]

5 Evaluation of EUV resist performance below 20nm CD using helium ion lithography
article 2014    
Author: Maas, D.J. · Veldhoven, E. van · Langen-Suurling, A. van · Alkemade, P.F.A. · Wuister, S. · Hoefnagels, R. · Verspaget, C. · Meessen, J. · Fliervoet, T.
Keywords: Nanotechnology · Energy transfer · EUV lithography · EUV resist characterization · Helium Ion Microscope · Lithography · Proximity effect · Scanning Helium Ion Beam Lithography · Electron beam lithography · Extreme ultraviolet lithography · Proximity correction · High Tech Systems & Materials · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[PDF] [Abstract]

6 Evaluation of EUV resist performance below 20nm CD using helium ion lithography
report 2014    
Author: Maas, D.J. · Veldhoven, E. van · Pohlmann, R.C.M. · Langen-Suurling, A. van · Alkemade, P.F.A. · Wulster, S. · Hoefnagels, R. · Verspaget, C. · Meessen, J. · Fliervoet, T.
Keywords: Nanotechnology · Energy transfer · EUV lithography · EUV resist characterization · Helium Ion Microscope · Lithography · Proximity effect · Scanning Helium Ion Beam Lithography · Electron beam lithography · Extreme ultraviolet lithography · Proximity correction · High Tech Systems & Materials · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[PDF]

Search results also available in MS Excel format.

Showing 1 to 6 of 6 found. | Sort by date