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1 Development of immersed diffraction grating for the TROPOMI-SWIR spectrometer
article 2010    
Author: Amerongen, A.H. van · Visser, H. · Vink, R.J.P. · Coppens, T. · Hoogeveen, R.W.M.
Keywords: Physics · grating · immersion · lithography · remote sensing · silicon · spectral imager
[PDF] [Abstract]

2 Feasibility of UV cleaning of 157-nm reticles
article 2003    
Author: Duisterwinkel, A.E. · Bastein, A.T.G.M. · Schaik, W. van
Keywords: 157 nm lithography · Contamination control · Molecular contamination · Reticle · Transmission loss · UV cleaning · Hydrocarbons · Ultraviolet radiation · Transmission loss · Lithography
[Abstract]

3 Evaluation of EUV resist performance below 20nm CD using helium ion lithography
article 2014    
Author: Maas, D.J. · Veldhoven, E. van · Langen-Suurling, A. van · Alkemade, P.F.A. · Wuister, S. · Hoefnagels, R. · Verspaget, C. · Meessen, J. · Fliervoet, T.
Keywords: Nanotechnology · Energy transfer · EUV lithography · EUV resist characterization · Helium Ion Microscope · Lithography · Proximity effect · Scanning Helium Ion Beam Lithography · Electron beam lithography · Extreme ultraviolet lithography · Proximity correction · High Tech Systems & Materials · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[PDF] [Abstract]

4 Evaluation of EUV resist performance below 20nm CD using helium ion lithography
report 2014    
Author: Maas, D.J. · Veldhoven, E. van · Pohlmann, R.C.M. · Langen-Suurling, A. van · Alkemade, P.F.A. · Wulster, S. · Hoefnagels, R. · Verspaget, C. · Meessen, J. · Fliervoet, T.
Keywords: Nanotechnology · Energy transfer · EUV lithography · EUV resist characterization · Helium Ion Microscope · Lithography · Proximity effect · Scanning Helium Ion Beam Lithography · Electron beam lithography · Extreme ultraviolet lithography · Proximity correction · High Tech Systems & Materials · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[PDF]

5 Fabrication of transistors on flexible substrates: from mass-printing to high-resolution alternative lithography strategies
article 2012    
Author: Moonen, P.F. · Yakimets, I. · Huskens, J.
Keywords: Electronics · flexible electronics · high-resolution printing · mass printing · nanoimprint lithography · soft lithography · High Tech Systems & Materials · Industrial Innovation · Mechatronics, Mechanics & Materials · HOL - Holst · TS - Technical Sciences
[Abstract]

6 Multi-level single mode 2D polymer waveguide optical interconnects using nano-imprint lithography
article 2015    
Author: Khan, M.U. · Justice, J. · Petäjä, J. · Korhonen, T. · Boersma, A. · Wiegersma, S. · Karppinen, M. · Corbett, B.
Keywords: Electronics · Lithography · Waveguide components · Waveguides · Multi-mode interference · Polymer waveguides · Nanoimprint lithography · Industrial Innovation · Nano Technology · MAS - Materials Solutions · TS - Technical Sciences
[Abstract]

7 High throughput STimulated Emission Depletion lithography
report 2019    
Author: Boersma, A. · Wang, Y. · Bäumer, S.M.B. · Lucas, P. · Willekers, R.W. · Halpin, A. · Gomez Rivas, J. · Hendriks, N. · Toonder, J. den
Keywords: Stimulated Emission Depletion (STED) lithography · STED lithography · ERP Early Research Program · ERP 3D Nanomanufacturing Instruments · High Tech Systems & Materials · Industrial Innovation
[Abstract]

8 Progress in EUV optics lifetime expectations
article 2004    
Author: Mertens, B.M. · Weiss, M. · Meiling, H. · Klein, R. · Louis, E. · Kurt, R. · Wedowski, M. · Trenkler, H. · Wolschrijn, B.T. · Jansen, R. · Runstraat, A. van de · Moors, R. · Spee, C.I.M.A. · Plöger, S. · Kruijs, R. van de
Keywords: Cap layers · Carbon growth · EUV lithography · Optics lifetime · Oxidation · Auger electron spectroscopy · Crack initiation · Hydrocarbons · Imaging techniques · Lithography · Microoptics · Mirrors · Optical systems · Optics lifetime · Ultraviolet radiation
[Abstract]

9 Detection of low concentration formaldehyde gas by photonic crystal sensor fabricated by nanoimprint process in polymer material
article 2014    
Author: Boersma, A. · Ee, R.J. van · Stevens, R.S.A. · Saalmink, M. · Charlton, M.D.B. · Pollard, M.E. · Chen, R. · Kontturi, V. · Karioja, P. · Alajoki, T.
Keywords: Nanoimprint lithography · Chemical detection · Chemical sensors · Electron beam lithography · Formaldehyde · Gas detectors · Nanoimprint lithography · Polymers · Refractive index · Chemical functionalization · Direct write electron-beam lithography · E-beam processing · Gas sensing applications · High refractive index · Low-concentration formaldehydes · Photonic crystal sensors · Two-dimensional photonic crystals · Photonic crystals · Industrial Innovation · Mechanics, Materials and Structures · MIP - Materials for Integrated Products · TS - Technical Sciences
[Abstract]

10 Prediction of the thermo-mechanical material behavior of PEN foil during photolithographic processing
article 2009    
Author: Barink, M. · Goorhuis, M. · Giesen P. · Furthner, F. · Yakimets, I.
Keywords: Bending behavior · Environmental factors · Flexible substrate · Lithographic process · Lithography process · Loading experiment · Organic materials · Plastic electronics · Thermo-mechanical · Thermomechanical model · Experiments · Lithography · Microelectronics · Microsystems · Plastic products · Simulators · Thermomechanical treatment · Substrates
[Abstract]

11 Impact of pixel-dose optimization on pattern fidelity for helium ion beam lithography on EUV resist
article 2015    
Author: Kalhor, N. · Mulckhuyse, W.F.W. · Alkemade, P.F.A. · Maas, D.J.
Keywords: Nanotechnology · Scanning helium ion beam lithography · EUV lithography · Chemically amplified resist · Metrology · Dose optimization modeling · Ion shot noise · Critical dimension · Line-width roughness · High Tech Systems & Materials · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences
[PDF] [Abstract]

12 High-throughput scanning probe instruments for nanopatterning, alignment, and overlay metrology
article 2018    
Author: Navarro, V. · Mohtashami, A. · Herfst, R.W. · Maturova, K. · Es, M.H. van · Piras, D. · Sadeghian Marnani, H.
Keywords: Electronics · Alignment and overlay · Patterning · Scanning probe lithography · Extreme ultraviolet lithography · Manufacture · Nanotechnology · Scanning probe microscopy · Contact holes · High throughput · Sub-surface imaging · High Tech Systems & Materials · Industrial Innovation
[Abstract]

13 Electrostatic mask protection for extreme ultraviolet lithography
article 2002    
Author: Moors, R. · Heerens, G.J.
Keywords: Instruments · Atmospheric pressure · Capacitors · Charged particles · Contamination · Electric fields · Electrostatics · Masks · Permittivity · Ultraviolet radiation · Extreme ultraviolet lithography (EUVL) · Photolithography
[Abstract]

14 The EUV program at ASML: an update
article 2003    
Author: Meiling, H. · Banine, V. · Kürz, P. · Blum, B. · Heerens, G.J. · Harned, N.
Keywords: Electronics · Mirrors · Molybdenum compounds · Optics · Oxidation · Sensors · Ultraviolet radiation · Water · Extreme ultraviolet lithography · Particle detection system · Photolithography
[PDF] [Abstract]

15 Impact of design-parameters on the optical performance of a highpower adaptive mirror
article 2017    
Author: Koek, W.D. · Nijkerk, M.D. · Smeltink, J.A. · Dool, T.C. van den · Zwet, E.J. van · Baars, G.E. van
Keywords: Electronics · Actuator pitch · Adaptive optics · Conversion efficiency · Deformable mirrors · Dimpling · EUV source · Top hat · Actuators · Carbon dioxide · Deformation · Extreme ultraviolet lithography · High power lasers · Laser beams · Laser diagnostics · Laser materials processing · Laser mirrors · Light sources · Lithography · Influence functions · Next generation lithography · Optical performance · High Tech Systems & Materials · Industrial Innovation · Nano Technology · OPT - Optics · TS - Technical Sciences
[PDF] [Abstract]

16 Submicrometer Top-Gate Self-Aligned a-IGZO TFTs by Substrate Conformal Imprint Lithography
article 2019    
Author: Ram, M.S. · Kort, L. de · Riet, J. de · Verbeek, R. · Bel, T. · Gelinck, G. · Kronemeijer, A.J.
Keywords: Amorphous indium gallium zinc oxide (a-IGZO) · Amorphous films · Amorphous semiconductors · Field effect transistors · Gallium compounds · II-VI semiconductors · Lithography · Nanoimprint lithography · Semiconducting indium compounds · Thin film circuits · Thin films · Zinc oxide · Amorphous indium gallium zinc oxides (a igzo) · Imprint lithography · Nano-imprint · Self-aligned · Thin film transistors
[Abstract]

17 A common gate thin film transistor on poly(ethylene naphthalate) foil using step-and-flash imprint lithography
article 2011    
Author: Moonen, P.F. · Vratzov, B. · Smaal, W.T.T. · Gelinck, G.H. · Peter, M. · Meinders, E.R. · Huskens, J.
Keywords: Electronics · Flexible thin film transistor · Foil-on-carrier · Step-and-flash imprint lithography · Bottom contacts · Bottom gate · Bottom-contact · Common gates · Flexible thin films · Foil-on-carrier · High quality · On/off ratio · Patterning techniques · Poly(ethylene naphthalate) · Residual layer thickness · Roll to roll · Source-drain · State-of-the-art devices · Step and flash imprint lithography · TIPS-pentacene · Dimensional stability · Ethylene · Fabrication · Nanoimprint lithography · Thin films · Transistors · Thin film transistors · High Tech Systems & Materials · Industrial Innovation · Mechatronics, Mechanics & Materials · HOL - Holst · TS - Technical Sciences
[Abstract]

18 Direct Laser Write (DLW) as a versatile tool in manufacturing templates for imprint lithography on flexible substrates
article 2009    
Author: Ivan, M.G. · Vaney, J.B. · Verhaart, D. · Meinders, E.R.
Keywords: Electronics · Direct laser write · Flexible substrate · Hot embossing · Nanoimprint lithography · Plastic electronics · Silicon template · Direct laser write · Disposable biosensor · Drain electrodes · Etch depth · Feature sizes · Flexible substrate · Hot embossing · Imprint lithography · Metallic circuits · Metallic layers · Plasma dry etching · Plastic electronics · Plastic substrates · SEM · Versatile tools · Biosensors · Computer control systems · Lasers · Nanoimprint lithography · Optical microscopy · Plasma etching · Plastics · Semiconducting silicon compounds · Silicon wafers · Substrates · Industrial Innovation
[PDF] [Abstract]

19 Design, fabrication and characterisation of nano-imprinted single mode waveguide structures for intra-chip optical communications
article 2015    
Author: Justice, J. · Khan, U. · Korhonen, T. · Boersma, A. · Wiegersma, S. · Karppinen, M. · Corbett, B.
Keywords: Industry Electronics · Nanoimprint lithography · On-board · Optical interconnect · Single mode waveguide · Industrial Innovation · Nano Technology · MAS - Materials Solutions · TS - Technical Sciences
[Abstract]

20 Double-layer imprint lithography on wafers and foils from the submicrometer to the millimeter scale
article 2011    
Author: Moonen, P.F. · Yakimets, I. · Peter, M. · Meinders, E.R. · Huskens, J.
Keywords: Physics · flexible substrates · heterogeneous polymer bonding · multidimensional pattern transfer · thermal nanoimprint lithography · High Tech Systems & Materials · Industrial Innovation · Mechatronics, Mechanics & Materials · HOL - Holst · TS - Technical Sciences
[Abstract]

Search results also available in MS Excel format.

Showing 1 to 20 of 45 found. Next | Sort by date