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1 Is helium ion beam induced processing applicable to EUV mask repair?
article 2012    
Author: Maas, D.J. · Bekman, H.H.P.T. · Veldhoven, E. van · Alkemade, P.F.A.
Keywords: Chemistry · helium ion microscopy · ion beam induced processing · EUV mask repair · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences

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