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Is helium ion beam induced processing applicable to EUV mask repair?

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Author: Maas, D.J. · Bekman, H.H.P.T. · Veldhoven, E. van · Alkemade, P.F.A.
Type:article
Date:2012
Source:15th European Microscopy Congress, 16-21 September 2012, Manchester, UK
Identifier: 463674
Keywords: Chemistry · helium ion microscopy · ion beam induced processing · EUV mask repair · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences