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Improved sub-surface AFM using photothermal excitation

Author: Keyvani Janbahan, A. · Reijzen, M.E. van · Tamer, M.S. · Es, M.H. van · Riel, M.C.J.M. van · Sadeghian Marnani, S. · Lans, M.J. van der
Type:lecture
Date:2019
Publisher: TNO
Place: Delft
Source:Proceedings Metrology, Inspection, and Process Control for Microlithography XXXII, 2018, San Jose, CA, USA
Identifier: 873678
Keywords: AFM · Subsurface imaging · Frequency modulation · Photothermal excitation · Critical dimensions and overlay metrology · High Tech Systems & Materials · Industrial Innovation