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Robust design procedure for dielectric resonator metasurface lens array

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Author: Silvestri, F. · Gerini, G. · Bäumer, S.M.B. · Zwet, E.J. van
Type:article
Date:2016
Publisher: Optical Society of America OSA
Source:Optics Express, 15, 24
Identifier: 574943
Article number: 29155
Keywords: Electronics · High Tech Systems & Materials · Industrial Innovation · Nano Technology · OPT - Optics OM - Opto-Mechatronics · TS - Technical Sciences

Abstract

In this paper, we present a design strategy for single layer metasurface lenses based on dielectric resonators. This strategy is based on a robust optimization procedure for the resonator distribution in order to meet required performances (e.g. encircled energy, bandwidth, field of view, etc.). Possible deviations due to manufacturing errors are taken into account in the design procedure. This is applied to the design of array of microlenses for maskless lithography applications. The final design shows more uniform focusing performances (bandwidth 20 nm at 395 nm - 415 nm, field of view±60 mrad) and increased robustness against manufacturing errors, compared to designs based on analytic phase projections.