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Lab- and field-test results of MFIG, the first real-time vacuum-contamination sensor

Author: Maas, D.J. · Muilwijk, P.M. · Putten, M. van · Graaf, F. de · Kievit, O. · Boerboom, P.B.T.H. · Koster, N.B.
Type:article
Date:2017
Publisher: SPIE
Source:Ukraintsev, V.A.Sanchez, M.I., 31st Conference on Metrology, Inspection, and Process Control for Microlithography, 29 February - 2 March 2017
Identifier: 748039
Keywords: Electronics · Molecular contamination · Vacuum · Sensor · Detection · Monitoring · Carbon contamination · Semiconductor manufacturing · Yield enhancement · High Tech Systems & Materials · Industrial Innovation · 2015 Nano Technology · NI - Nano Instrumentation · TS - Technical Sciences

Abstract

To produce high-end products, clean vacuum is often required. Even small amounts of high-mass molecules can reduce product yield. The challenge is to timely detect the presence of relevant contaminants. Here is where MFIG can help1. The massfiltered ion gauge sensor (MFIG) continuously and selectively monitors the presence of high-mass contaminant molecules with a sensitivity down to 1E-13 mbar at total pressuresup to 1E-5mbar. This contribution presents field-test data to demonstrate the capabilities of the latest MFIG sensor in continuously and selectively detecting high-mass contaminant moleculesin (U)HVvacuum.