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Fast resist-activation dosimetry for extreme ultra-violet lithography (EUVL)

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Author: Heo, J. · Xu, M. · Maas, D.J.
Type:lecture
Date:2017
Source:EIBPN Conference, 61st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, 30 May - 2 June 2017, Orlando, FL, USA
Identifier: 763931
Keywords: Electronics · High Tech Systems & Materials · Industrial Innovation · Nano Technology · OPT - Optics NI - Nano Instrumentation · TS - Technical Sciences