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Realisation of a vacuum system of an EUV Exposure System

Author: Molkenboer, F.T.
Type:lecture
Date:2017
Publisher: TNO
Place: Delft
Source:NEVAC Day (Nederlandse Vacuum Vereniging), 12 May 2017, DIFFER, Eindhoven, The Netherlands
Identifier: 763217
Keywords: Electronics · High Tech Systems & Materials · Industrial Innovation · Nano Technology · NI - Nano Instrumentation OM - Opto-Mechatronics IM - Instrument Manufacturing SSE - Space Systems Engineering · TS - Technical Sciences

Abstract

EBL2 is not a setup for producing semiconductor devices. The experiments for which EBL2 is intended are: accelerated lifetime tests for EUV Mirrors; EUV Reticles and pellicles; and Materials used in EUV lithography. This kind of research is needed due to the harsh EUV environment, and EUV lithography is coming to market. EBL2 is able to manipulate and to illuminate EUV reticles with scanner compatibility.