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Implementation of background scattering variance reduction on the RapidNano particle scanner

Author: Walle, P. van der · Hannemann, S. · Eijk, D. van · Mulckhuyse, W.F.W. · Donck, J.C.J. van der
Type:article
Date:2014
Publisher: SPIE
Source:SPIE Advanced Lithography Conference, Metrology, Inspection, and Process Control for Microlithography XXVIII, 23-27 February 2014, San Jose, CA, USA, 9050
series:
Proceedings of SPIE - The International Society for Optical Engineering
Identifier: 507118
ISBN: 9780819499738
Article number: 905033
Keywords: Nanotechnology · RapidNano particle scanner · EUV reticle handling · Scattering · High Tech Systems & Materials · Industrial Innovation · Physics & Electronics Fluid Mechanics Chemistry & Energetics · NI - Nano Instrumentation PID - Process & Instrument Development · TS - Technical Sciences

Abstract

The background in simple dark field particle inspection shows a high scatter variance which cannot be distinguished from signals by small particles. According to our models, illumination from different azimuths can reduce the background variance. A multi-azimuth illumination has been successfully integrated on the Rapid Nano particle scanner. This illumination method reduces the variance of the background scattering on substrate roughness. It allows for a lower setting of the detection threshold, resulting in a more sensitive inspection system. By implementing this system the lower detection limit of the scanner was reduced from 59 nm to 42 nm LSE. A next improvement, a change of the inspection wavelength to 193 nm will bring the detection limit to sub 20 nm. © 2014 SPIE.