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Development of APCVD process for high quality TCO

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Author: Deelen, J. van · Mol, A.M.B. van · Poodt, P.W.G. · Grob, F. · Spee, C.I.M.A.
Institution: TNO Industrie en Techniek
Source:2009 34th IEEE Photovoltaic Specialists Conference, PVSC 2009, 7 June 2009 through 12 June 2009, Philadelphia, PA, USA. reference code: 79913, 271-275
Identifier: 352070
ISBN: 9781424429509
Article number: No.: 5411680
Keywords: Materials · Atmospheric deposition process · Atmospheric pressure CVD · High quality · Plasma-enhanced CVD · PV modules · Research and development · Roll to roll manufacturing · Transparent conductive oxides · Atmospheric pressure · Deposition · Meteorological problems · Plasma deposition · Tin · Tin oxides · Titanium compounds · Zinc · Zinc oxide · Chemical vapor deposition · Industrial Innovation


For the past decade TNO has been involved in the research and development of atmospheric pressure CVD (APCVD) and plasma enhanced CVD (PECVD) processes for deposition of transparent conductive oxides (TCO), such as tin oxide and zinc oxide. The use of atmospheric deposition processes allows for large scale roll to roll manufacturing, and is therefore expected to provide a breakthrough for lowering the price of thin film PV modules. 2009 IEEE.