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TNO reticle handling test platform

Author: Crowcombe, W.E. · Hollemans, C.L. · Fritz, E.C. · Donck, J.C.J. van der · Koster, N.B.
Type:article
Date:2014
Publisher: SPIE
Source:Extreme Ultraviolet (EUV) Lithography V, 24-27 February 2014, San Jose, CA, USA, 9048
series:
Proceedings of SPIE - The International Society for Optical Engineering
Identifier: 507149
ISBN: 9780819499714
Article number: 904831
Keywords: Nanotechnology · EUV · Ultra-clean · Molecular physics · Modular concepts · Particle detection · Reticle handling · Testing platforms · Optical instruments · High Tech Systems & Materials · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences

Abstract

Particle free handling of EUV reticles is a major concern in industry. For reaching economically feasible yield levels, it is reported that Particle-per-Reticle-Pass (PRP) levels should be better than 0.0001 for particles larger than 18 nm. Such cleanliness levels are yet to be reported for current reticle handling systems. A reticle handler was built based on a modular concept with three uniform linked base frames. In the first stage of the project a dual pod loading unit, two exchange units for opening inner pods and a reticle flip unit are installed on the base frames. In the near future improvements on cleanliness will be tested and particle detection equipment will be integrated. The system will act as a testing platform for clean handling technology for industry. © 2014 SPIE.