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Latest developments on EUV reticle and pellicle research and technology at TNO

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Author: Verberk, R. · Koster, N.B. · Sligte, E. te · Staring, W.P.M.
Type:article
Date:2017
Publisher: SPIE
Source:Finders, J.Behringer, U.F.W., 33rd European Mask and Lithography Conference, EMLC 2017, 26-28 June 2017, Dresden, Germany, 10446
Identifier: 781879
ISBN: 9781510613560
Article number: 1044603
Keywords: Electronics · EUV mask infra structure · EUV reticle · pellicle · Acceptance tests · Inspection · Masks · Optical tomography · Stages · Contamination control · Infra-structure · Optics lifetime · Pellicle · Optical instruments · Industrial Innovation · Nano Technology · NI - Nano Instrumentation · TS - Technical Sciences