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Fabrication of nano-photonic components on SOI with advanced e-beam lithography

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Author: Schmits, R.
Type:article
Date:2011
Source:17th Seminar on Electron and Ion Beam Lithography for Applications in Nanotechnology (NANO2011), Dortmund, Germany, 22 February 2011
Identifier: 427947
Keywords: Nanotechnology · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences

Abstract

We have used an advanced electron-beam lithography tool from Raith for the fabrication of dedicated nano-photonic components such as optical waveguides on silicon-on-insulator platform. Combination of the fixed-beam-moving-stage capabilities, proximity corrected write-field exposure and interferometer laser measurement on the wafers will results in a high fabrication speed with extreme accuracy. Optimization of the complete fabrication process, like the choice of photo resist and specific post-processing steps, simplifies the procedure to get high throughput of complete devices and their components for research goals. All described techniques are also aligned with CMOS mass production procedure which will lead to reduced costs.