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Helium ion lithography principles and performance

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Author: Drift, E. van der · Maas, D.J.
Publisher: Springer-Verlag
Place: Vienna
Source:Nanofabrication : techniques and principles, 93-116
Identifier: 526244
ISBN: 9783709104231
Keywords: Nanotechnology · Industrial Innovation · Physics & Electronics · NI - Nano Instrumentation · TS - Technical Sciences


Recent developments show that Scanning Helium Ion Beam Lithography (SHIBL) with a sub-nanometer beam diameter is a promising alternative fabrication technique for high-resolution nanostructures at high pattern densities. Key principles and critical conditions of the technique are explained. From existing data, the fundamental factors underlying the sensitivity gain by 1-2 orders of magnitude and the prospects for high resolution at high pattern densities are analysed. State-of-The-Art performance of the technique is illustrated with experimental achievements in HSQ and PMMA resists. Exploratory SHIBL work on aluminum oxide resist is presented as a novel approach to overcome potential shot noise effects in pattern definition and to improve masking capabilities in subsequent pattern transfer.