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First results from the Large Dynamic Range Atomic Force Microscope for overlay metrology

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Author: Witvoet, G. · Peters, J. · Kuiper, S. · Keyvani, S. · Willekers, R.W.
Publisher: SPIE
Source:Ukraintsev, V.A.Adan, O., Proceedings Metrology, Inspection, and Process Control for Microlithography XXXIII, 25-28 February 2019, San Jose, CA, USA
Identifier: 867797
doi: doi:10.1117/12.2514044/
ISBN: 9781510625655
Article number: 109592E
Keywords: AFM · LDR-AFM · Control · Identification · Metrology · Overlay · Positioning · Atomic force microscopy · Microscopy · High Tech Systems & Materials · Industrial Innovation


TNO is developing a novel Large Dynamic Range Atomic Force Microscope (LDR-AFM), primarily but not exclusively designed for sub-nm accurate overlay metrology. The LDR-AFM combines an AFM with a 6 degrees- of-freedom interferometric positioning stage, thereby enabling measurements of sub-nm features on a wafer over multiple millimeters marker-to-feature distances. The current work provides an overview of recent developments and presents the first results obtained after final integration of the complete system. This includes results on the AFM head development, the validated positioning stage performance, the first AFM images, and long-term stability measurements.