Direct Wafer-Scale CVD Graphene Growth under Platinum Thin-Films

Direct Wafer-Scale CVD Graphene Growth under Platinum Thin-Films

Hagendoorn, Y. (TU Delft Dynamics of Micro and Nano Systems)
Pandraud, G. (TU Delft Photovoltaic Materials and Devices)
Vollebregt, S. (TU Delft Electronic Components, Technology and Materials)
Morana, B. (TU Delft EKL Equipment)
Sarro, Pasqualina M (TU Delft Electronic Components, Technology and Materials)
Steeneken, P.G. (TU Delft Dynamics of Micro and Nano Systems)

2022

Since the transfer process of graphene from a dedicated growth substrate to another substrate is prone to induce defects and contamination and can increase costs, there is a large interest in methods for growing graphene directly on silicon wafers. Here, we demonstrate the direct CVD growth of graphene on a SiO2 layer on a silicon wafer by employing a Pt thin film as catalyst. We pattern the platinum film, after which a CVD graphene layer is grown at the interface between the SiO2 and the Pt. After removing the Pt, Raman spectroscopy demonstrates the local growth of monolayer graphene on SiO2. By tuning the CVD process, we were able to fully cover 4-inch oxidized silicon wafers with transfer-free monolayer graphene, a result that is not easily obtained using other methods. By adding Ta structures, local graphene growth on SiO2 is selectively blocked, allowing the controlled graphene growth on areas selected by mask design

graphene synthesis
CVD
nanofabrication
thin films
silicon technology

http://resolver.tudelft.nl/uuid:8bf8e2b9-fc3c-4cff-b04d-3c30f835785f

https://doi.org/10.3390/ma15103723

1996-1944

Materials, 15 (10)

Institutional Repository

journal article

© 2022 Y. Hagendoorn, G. Pandraud, S. Vollebregt, B. Morana, Pasqualina M Sarro, P.G. Steeneken