Print Email Facebook Twitter High-resistivity nanogranular Co–Al–O films for high-frequency applications Title High-resistivity nanogranular Co–Al–O films for high-frequency applications Author Khalili Amiri, P. Zhuang, Y. Schellevis, H. Rejaei, B. Vroubel, M. Ma, Y. Burghartz, J.N. Faculty Electrical Engineering, Mathematics and Computer Science Department DIMES Date 2007-04-16 Abstract This work presents a series of high-resistivity nanogranular Co–Al–O films with maximum resistivity of ? 110?m??cm. The films were deposited using pulsed dc reactive sputtering of a Co72Al28 target in an oxygen/argon ambient. The samples were characterized by scanning electron microscopy (SEM), M-H loop measurements, and s-parameter measurements on microstrip transmission lines with Co–Al–O magnetic cores. The high-frequency magnetic permeability profile was extracted from the microstrip measurements. Reduction of deposition power resulted in resistivity enhancement, as well as reduction of coercivity and permeability. SEM images reveal an average grain size of ? 80?nm for films with the highest resistivity. Subject cobalt compoundsnanostructured materialsgranular materialsmagnetic thin filmssputtered coatingselectrical resistivityscanning electron microscopymagnetic hysteresismagnetic permeabilitycoercive forcegrain size To reference this document use: http://resolver.tudelft.nl/uuid:7d5c623a-5a37-47ec-be50-fc315226de30 DOI https://doi.org/10.1063/1.2710235 Publisher American Institute of Physics ISSN 0021-8979 Source http://link.aip.org/link/JAPIAU/v101/i9/p09M508/s1 Source Journal of Applied Physics, 101 (9), 2007 Part of collection Institutional Repository Document type journal article Rights (c) 2007 The Author(s); American Institute of Physics Files PDF Khalili_2007.pdf 168.13 KB Close viewer /islandora/object/uuid:7d5c623a-5a37-47ec-be50-fc315226de30/datastream/OBJ/view