Moret, J.L.T.M. (author), Griffiths, Matthew B.E. (author), Frijns, Jeannine E.B.M. (author), Terpstra, B.E. (author), Wolterbeek, H.T. (author), Barry, Seán T. (author), Denkova, A.G. (author), van Ommen, J.R. (author) Atomic layer deposition (ALD) is a versatile gas phase coating technique that allows coating of complex structured materials, as well as high-surface area materials such as nanoparticles. In this work, ALD is used to deposit a lutetium oxide layer on TiO<sub>2</sub> nanoparticles (P25) in a fluidized bed reactor to produce particles for...
journal article 2020
