Guo, J. (author), Yuan, Shaojun (author), Yu, Yangyang (author), van Ommen, J.R. (author), Van Bui, Hao (author), Liang, Bin (author) This work presents a novel chemical vapor deposition (CVD) approach that enables the deposition of ultrathin and conformal SiO<sub>2</sub> layers on TiO<sub>2</sub> anatase nanoparticles at room temperature using SiCl<sub>4</sub> and air containing water without the use of a catalyst. The morphology of the CVD-grown SiO<sub>2</sub> layers was...
journal article 2017
