Photocatalytic Properties of SiO2 coated Degussa P25 TiO2 Nanoparticles by Scalable Atmospheric Pressure Atomic Layer Deposition

A precise control for the growth of thin film powered by atmospheric pressure atomic layer deposition (ALD) carried out in fluidized bed reactor makes the ultrathin conformal coating of SiO2 on Degussa P25 TiO2 nanoparticles possible. At an operating temperature which can be lowered to room temperature (~27°C), the growth per cycle (GPC) smaller...