- document
- Van Veldhoven, E. (author), Sidorkin, V. (author), Chen, P. (author), Alkemade, P. (author), Van der Drift, E. (author), Salemink, H. (author), Zandbergen, H. (author), Maas, D. (author) journal article 2010
- document
-
Sidorkin, V.A. (author), Alkemade, P.F.A. (author), Salemink, H.W.M. (author), Schmits, R. (author), Van der Drift, E. (author)A method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist is provided for enhanced pattern-transfer capabilities. The essence of the proposed method is to form a protective “cap” on top of the resist structure by means of electron-beam-induced deposition (EBID) in a self-aligned approach. This is...journal article 2009
- document
-
Sidorkin, V. (author), Van Veldhoven, E. (author), Van der Drift, E.W.J.M. (author), Alkemade, P.F.A. (author), Salemink, H. (author), Maas, D. (author)Scanning helium ion beam lithography is presented as a promising pattern definition technique for dense sub-10-nm structures. The powerful performance in terms of high resolution, high sensitivity, and a low proximity effect is demonstrated in a hydrogen silsesquioxane resist.journal article 2009