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- Van Veldhoven, E. (author), Sidorkin, V. (author), Chen, P. (author), Alkemade, P. (author), Van der Drift, E. (author), Salemink, H. (author), Zandbergen, H. (author), Maas, D. (author) journal article 2010
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Sidorkin, V. (author), Van Veldhoven, E. (author), Van der Drift, E.W.J.M. (author), Alkemade, P.F.A. (author), Salemink, H. (author), Maas, D. (author)Scanning helium ion beam lithography is presented as a promising pattern definition technique for dense sub-10-nm structures. The powerful performance in terms of high resolution, high sensitivity, and a low proximity effect is demonstrated in a hydrogen silsesquioxane resist.journal article 2009