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De Boer, D.K.G. (author), Urbach, H.P. (author), Xu, M. (author)Poster presentation Optics Research Group TU Delft in cooperation with Philips and STWjournal article 2006
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Brok, J.M. (author), Urbach, H.P. (author)We discuss a mode expansion technique to rigorously model the diffraction from three-dimensional pits and holes in a perfectly conducting layer with finite thickness. On the basis of our simulations we predict extraordinary transmission through a single hole, caused by the Fabry-Perot effect inside the hole. Furthermore, we study the fundamental...journal article 2006
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Wei, X. (author), Urbach, H.P. (author), Wachters, A. (author), Aksenov, Y. (author)The polarization induced by the mask is studied by using a 3D rigorous model, wich solves Maxwell equations using the finite element method. Teh aerial image depends strongly on the change of polarization induced by the materials, thickness of the layer and pitch of the periodic masks.conference paper 2005
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Xu, M. (author), Urbach, H.P. (author), De Boer, D.K.G. (author), Cornelissen, H.J. (author)The application of wire grid polarizers as efficient polarizing beam splitters for visible light is studied. The large differences between the transmissivity for different polarizations are explained qualitatively by using the theory of metallic wave guides. The results of rigorous calculations obtained by using the finite element method are...journal article 2005
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Polo, A. (author), Bociort, F. (author), Pereira, S.F. (author), Urbach, H.P. (author)Accurate wavefront aberration measurement are essential for next-generation Extreme Ultraviolet (EUV) Lithography. During the past years several accurate interferometric techniques have been developed, but these techniques have limitation. In this work we discuss a different technique based on the Hartmann Wavefront Sensor that requires no...conference paper