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Sidorkin, V.A. (author), Alkemade, P.F.A. (author), Salemink, H.W.M. (author), Schmits, R. (author), Van der Drift, E. (author)A method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist is provided for enhanced pattern-transfer capabilities. The essence of the proposed method is to form a protective “cap” on top of the resist structure by means of electron-beam-induced deposition (EBID) in a self-aligned approach. This is...journal article 2009