Method of designing a projection system, lithographic apparatus and device manufacturing method

Optimization of a projection system is performed to obtain a starting configuration that is at a local minimum of the merit function or simply a previously known minimum system is used as the starting configuration. A zero-thickness meniscus lens is inserted at a surface in the local minimum starting configuration with N surfaces to construct a...

Projection system design method, lithography apparatus, and device manufacturing method

PROBLEM TO BE SOLVED: To provide a method of designing a projection system for a lithography projection apparatus, to provide a lithography apparatus comprising the projection system, and to provide a method for manufacturing a device by using the projection system. ; SOLUTION: In the first place, local optimization of the projection system is...