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Polo, A. (author), Bociort, F. (author), Pereira, S.F. (author), Urbach, H.P. (author)Accurate wavefront aberration measurement are essential for next-generation Extreme Ultraviolet (EUV) Lithography. During the past years several accurate interferometric techniques have been developed, but these techniques have limitation. In this work we discuss a different technique based on the Hartmann Wavefront Sensor that requires no...conference paper