Wavelength influence on the determination of subwavelength grating parameters by using optical scatterometry

As the semiconductor industry rapidly approaches the 3nm lithography node, on product overlay (OPO) requirements have become tighter and as a result, residuals magnitude requirements have become even more challenging. Metrology performance enhancements are required to meet these demands. Color Per Layer (CPL) is a unique imaging overlay...

Coherent fourier scatterometry

The electronics which makes our lives easier like mobiles, computers, digital cameras contain chips with very small semiconductor components like transistors. When transistors can be made even smaller, the chip can accommodate a larger number of components, which gives more processing capacity, resulting in a faster device with an increased...