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Klijnjan, Tim (author)Extreme Ultraviolet lithography is a vital step in the production of cutting edge computer chips that drive emergent technologies like AI, VR and the internet of things [1]. Careful control of Ultraviolet light beams by EUV machine modules such as the Unicom, Uniformity correction module, enable extremely precise printing of nano-scale...master thesis 2024
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Hari, S. (author), van Dorp, Willem F. (author), Mulders, Johannes J.L. (author), Trompenaars, Piet H.F. (author), Kruit, P. (author), Hagen, C.W. (author)Structures fabricated using focused electron beam-induced deposition (FEBID) have sloped sidewalls because of the very nature of the deposition process. For applications this is highly undesirable, especially when neighboring structures are interconnected. A new technique combining FEBID and focused electron beam-induced etching (FEBIE) has...journal article 2024
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Mohan, Adithya Keshav (author)Ceramics are being explored as an alternative material by ASML to replace their stainless steel 316L (SS316L) reticle masking blades. Ceramics offer distinct advantages over stainless steel in the semiconductor industry. While stainless steel exhibits good mechanical strength, ceramics excel in electrical insulation and thermal conductivity,...master thesis 2023
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RAMACHANDRAN, NAAGARAJAN (author)Pressurized liquid Tin finds application in the generation of Extreme Ultra-Violet light for semiconductor lithography. In order to improve the throughput of the lithography systems, tin must be pressurized to higher levels, and in turn, new pressurization methods are needed.<br/><br/>A phase change tin pump is an innovative system that...master thesis 2023
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van Loo, N. (author)The development of quantum computers is perhaps one of the most exciting innovations of our time. The most investigated quantum computers, however, suffer from the fact that quantum information is lost due to interaction between the quantum bits and their environment. As a radically different approach, it has been proposed that one can instead...doctoral thesis 2023
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Neeft, Tobias (author)Silicon wafers and solar cells are delicate components used in the semiconductor industries and energy industries. Handling and transportation can easily damage these components. Conventional handling methods with mechanical contact can cause various damages to these delicate surfaces. Air bearings can provide a solution by enabling an almost...master thesis 2023
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Ganjian, M. (author), Modaresifar, K. (author), Rompolas, Dionysios (author), Fratila-Apachitei, E.L. (author), Zadpoor, A.A. (author)Developing high-throughput nanopatterning techniques that also allow for precise control over the dimensions of the fabricated features is essential for the study of cell-nanopattern interactions. Here, we developed a process that fulfills both of these criteria. Firstly, we used electron-beam lithography (EBL) to fabricate precisely...journal article 2022
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Ivančević, Lovro (author)The lack of reliable human physiology models in vitro combined with an ever-increasing set of health and safety requirements imposed by pharmaceutical regulatory agencies across the world is causing a concerningly low number of new drugs to reach the market. Organ-on-Chip (OoC) technology aims to aid faster development of new drugs by providing...master thesis 2021
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Ajroemjan, Wahhe (author)The packaging of a microchip affects its size, performance and cost. With advanced packaging, more efficient and smaller microchips can be produced. For this, advanced packaging stepper systems are used, which are lithography machines with a highly optimized projection lens system, that use a powerful light source. The projection lens system for...master thesis 2021
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Jain, Akash (author)An ever-increasing demand for making microchips smaller and quicker pushes for the advancement of lithography machines. System dynamics plays an important role in determining the performance of a lithography machine. This thesis is aimed to increase the throughput of an electron beam lithography machine, mainly for sparse patterns, by improving...master thesis 2021
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Neelen, Rob (author)Roll-to-Plate (R2P) nanoimprint lithography (NIL) is a fabrication process with the potential for low-cost high-volume fabrication of micro- and nano-patterns on large areas. As a result, R2P is regarded as a promising production process for micro- and nano-scale features which exceed the conventional wafer sizes. In addition, the process has...master thesis 2021
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Leliveld, Robert (author)This thesis describes a study into pairwise particle interactions within a Hele-Shaw geometry, using stop-flow lithography. By exposing a photoreactive mixture to a strong UV-pulse, a hydrogel is formed. The shape of this hydrogel is controlled by masking part of the light beam. This process takes place while the Hele-Shaw channel is placed on...master thesis 2021
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Hari, S. (author), Trompenaars, P. H.F. (author), Mulders, J. J.L. (author), Kruit, P. (author), Hagen, C.W. (author)High resolution dense lines patterned by focused electron beam-induced deposition (FEBID) have been demonstrated to be promising for lithography. One of the challenges is the presence of interconnecting material, which is often carbonaceous, between the lines as a result of the Gaussian line profile. We demonstrate the use of focused electron...journal article 2021
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Van Delft, Falco C.M.J.M. (author), Sudalaiyadum Perumal, Ayyappasamy (author), van Langen-Suurling, A.K. (author), de Boer, C.R. (author), Kašpar, Ondřej (author), Tokárová, Viola (author), Dirne, F. (author), Nicolau, Dan V. (author)Non-deterministic polynomial (NP-) complete problems, whose number of possible solutions grows exponentially with the number of variables, require by necessity massively parallel computation. Because sequential computers, such as solid state-based ones, can solve only small instances of these problems within a reasonable time frame, parallel...journal article 2021
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Singh, Gyanendra (author), Lesne, E.L. (author), Winkler, Dag (author), Claeson, Tord (author), Bauch, Thilo (author), Lombardi, Floriana (author), Caviglia, A. (author), Kalaboukhov, Alexei (author)The interface between two wide band-gap insulators, LaAlO<sub>3</sub> and SrTiO<sub>3</sub> (LAO/STO), hosts a quasi-two-dimensional electron gas (q2DEG), two-dimensional superconductivity, ferromagnetism, and giant Rashba spin-orbit coupling. The co-existence of two-dimensional superconductivity with gate-tunable spin-orbit coupling and...journal article 2021
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Bhardwaj, Shikhar (author)Advancements in the semiconductor manufacturing processes, particularly photo-lithography, contribute to the sustainability goals of the modern society by enabling production of cheaper, more efficient computer chips. This thesis work focused on improvements to a technique called immersion lithography that uses a confined pool of liquid as the...master thesis 2020
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van der Velden, Gijs (author), Fan, D. (author), Staufer, U. (author)Organ-on-chip (OoC) technology is increasingly used for biomedical research and to speed up the process of bringing a drug from lab to the market. The main fluidic components of an OoC device are microfluidic channels and porous membranes arranged in three dimensions. Current chips are often assembled from several parts. In the development...journal article 2020
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Lugier, Olivier (author), Troglia, Alessandro (author), Sadegh, Najmeh (author), van Kessel, L.C.P.M. (author), Bliem, Roland (author), Mahne, Nicola (author), Nannarone, Stefano (author), Castellanos, Sonia (author)The semiconductor industry plans to keep fabricating integrated circuits, progressively decreasing there features size, by employing extreme ultraviolet lithography (EUVL). With this method, new designs and concepts for photoresist materials need to be conceived. In this work, we explore an alternative concept to the classic photoresist...journal article 2020
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Saraswat, Yug C. (author), Ibis, F. (author), Rossi, L. (author), Sasso, L. (author), Eral, H.B. (author), Fanzio, P. (author)Hypothesis: Our ability to dictate the colloid geometry is intimately related to self-assembly. The synthesis of anisotropic colloidal particles is currently dominated by wet chemistry and lithographic techniques. The wet chemical synthesis offers limited particle geometries at bulk quantities. Lithographic techniques, on the other hand,...journal article 2020
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van Kessel, L.C.P.M. (author), Hagen, C.W. (author)Monte Carlo simulations are frequently used to describe electron–matter interaction in the 0–50 keV energy range. It often takes hours to simulate electron microscope images using first-principle physical models. In an attempt to maintain a reasonable speed, empirical models are sometimes used. We present an open-source software package with...journal article 2020