High-resistivity nanogranular Co–Al–O films for high-frequency applications

This work presents a series of high-resistivity nanogranular Co–Al–O films with maximum resistivity of ? 110?m??cm. The films were deposited using pulsed dc reactive sputtering of a Co72Al28 target in an oxygen/argon ambient. The samples were characterized by scanning electron microscopy (SEM), M-H loop measurements, and s-parameter measurements...

Stress in sputter-deposited Cr films: Influence of Ar pressure

We studied the tensile stress and grain-width evolution in sputter-deposited Cr films with thickness from 20?nm to 2.7??m. Films were deposited in an industrial Hauzer 750 physical vapor deposition machine at 50–80?°C. The films exhibited a columnar microstructure. A power law behavior of the tensile stress as well as of the average grain width...