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Botman, A. (author), Hagen, C.W. (author), Li, J. (author), Thiel, B.L. (author), Dunn, K.A. (author), Mulders, J.J.L. (author), Randolph, S. (author), Toth, M. (author)
The material grown in a scanning electron microscope by electron beam-induced deposition (EBID) using Pt(PF3)4 precursor is shown to be electron beam sensitive. The effects of deposition time and postgrowth electron irradiation on the microstructure and resistivity of the deposits were assessed by transmission electron microscopy, selected area...
journal article 2009
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Botman, A. (author), Hesselberth, M. (author), Mulders, J.J.L. (author)
Focused electron-beam-induced deposition (EBID) allows the rapid fabrication of three-dimensional nanodevices and metallic wiring of nanostructures, and is a promising technique for many applications in nanoresearch. The authors present two topics on platinum-containing nanostructures created by EBID. First, they report on a TEM study of the...
journal article 2008
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Silvis-Cividjian, N. (author), Hagen, C.W. (author), Kruijt, P. (author), Van der Stam, M.A.J. (author), Groen, H.B. (author)
Electron-beam-induced deposition (EBID) is a potentially fast and resistless deposition technique which might overcome the fundamental resolution limits of conventional electron-beam lithography. We advance the understanding of the EBID process by simulating the structure growth. The merit of our model is that it explains the shapes of...
journal article 2003